| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7580c986f51e744d448b76d00ee1e279
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_48e433c67761dfbc253cd562901e01d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_967c464ab59d24734648147b35de5f0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_532ef5ff4bf2baa06f8a454c6bb8f819
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8c88482f64d4b18c23a6a7308a77f2a7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-701
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70191
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-702 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2009-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e424051e5481900224ec1e2f21e650a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a46e256ef87259c0fba6a0f64043353
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1808d9822511e53444d40699aa9d9d76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d2c6cedac04397e46de97759bf73e73 |
| publicationDate |
2010-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2010108516-A1 |
| titleOfInvention |
Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind |
| abstract |
An illumination optical system for EUV microlithography is used to route an illumination light beam from a radiation source to an object field. At least one EUV mirror (13) has a reflective face (29) with a nonplanar mirror topography for the purpose of forming the illumination light beam. The EUV mirror (13) has at least one EUV attenuator arranged in front of it. The attenuator face which faces the reflective face (29) of the EUV mirror (13) has an attenuator topography which is designed to complement the mirror topography such that at least sections of the attenuator face are arranged at a constant interval from the reflective face (29). The result is an illumination optical system in which it is possible to correct unwanted variations in illumination parameters, for example an illumination intensity distribution or an illumination angle distribution, over the object field with as few unwanted radiation losses as possible. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7071436-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10948637-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I633399-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102012210174-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020122989-A |
| priorityDate |
2009-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |