http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010098000-A1

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filingDate 2009-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db6bdef1f1aa079d4cd0c25c0932bda8
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publicationDate 2010-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2010098000-A1
titleOfInvention Device for examining pattern on surface of substrate and method for examining pattern
abstract A device for examining a pattern on a surface of a substrate enables high-speed examination of the substrate including the pattern finer than the resolution limit of light. The device comprises a near-field optical head (101) having a fine repetitive pattern, a ? driving unit (311) for relatively scanning the near-field optical head (101) and a substrate (900) to be examined with each other, a gap retaining mechanism for invariably retaining the gap between the near-field optical head (101) and the substrate (900) to be examined, a light source (110) for irradiating the near-field optical head (101) with light, a detecting system (201) for detecting the intensity of scattered light produced by the interaction between the fine repetitive pattern on the near-field optical head (101) and the fine pattern on the surface of the substrate (900) to be examined, and a signal processing unit (321) for examining the fine pattern on the substrate (900) to be examined according to the output of the detecting system (201).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11287375-B2
priorityDate 2009-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 34.