http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010093567-A2

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publicationDate 2010-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2010093567-A2
titleOfInvention Method for fabricating a semiconductor device having a lanthanum-family-based oxide layer
abstract Methods for fabricating a semiconductor device having a lanthanum-family- based oxide layer are described. A gate stack having a lanthanum-family-based oxide layer is provided above a substrate. At least a portion of the lanthanum-family-based oxide layer is modified to form a lanthanum-family-based halide portion. The lanthanum-family-based halide portion is removed with a water vapor treatment.
priorityDate 2009-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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