http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010093004-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_663cad2cddb9415ae5ba8d9c99803cda http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6e4bcfff82f0aab183c476343e3359ea |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F299-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-38 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F283-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2010-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f46241e100b7aff6199725e43d57806e |
| publicationDate | 2010-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2010093004-A1 |
| titleOfInvention | Photosensitive lithographic printing plate material |
| abstract | Disclosed is a photosensitive lithographic printing plate material which is highly sensitive, does not cause scumming when the material is developed with a neutral developing solution having a pH value of less than 9 or an alkaline developing solution having a pH value of 9 to 12 or when the material is left stand for a long period after a developing treatment or during printing, and has excellent plate wear resistance and excellent ink-trapping properties. Specifically disclosed is a photosensitive lithographic printing plate material which is characterize by comprising a support and a photocurable photosensitive layer formed on the support, wherein the photocurable photosensitive layer comprises a polymer that is synthesized using at least a compound represented by general formula (I) [wherein R1, R2 and R3 independently represent an alkyl or alkoxy group having 1 to 10 carbon atoms, wherein at least two of R1, R2 and R3 independently represent the alkoxy group; and Y1 represents an alkylene group having 1 to 10 carbon atoms] and has a polymerizable double bond group and at least one group selected from a carboxyl group and a sulfonate group in a side chain thereof. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104981355-A |
| priorityDate | 2009-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 277.