| abstract |
Antireflective coatings produced from silsesquioxane resin is comprised of the units (Ph(CH 2 ) r SiO (3_x)/2 (OR') x ) m (HSiO (3_x)/2 (OR') x ) n (MeSiO (3.x)/2 (OR') x ) o (RSiO (3-x)/2 (OR') x ) p (R 1 SiO (3-x)/2 (OR') x ) q where Ph is a phenyl group, Me is a methyl group; R' is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selected from a carboxylic acid group or a carboxylic acid forming group with the proviso that there is a sufficient amount of carboxylic acid groups to make the resin wet etchable after cure; and R is selected from substituted phenyl groups, ester groups, polyether groups; mercapto groups, sulfur-containing organic functional groups, hydroxyl producing group, aryl sulphonic ester groups, and reactive or curable organic functional groups; and r has a value of 0, 1, 2, 3, or 4; x has a value of 0, 1 or 2; wherein in the resin m has a value of 0 to 0.90; n has a value of 0.05 to 0.99; o has a value of 0 to 0.95; p has a value of 0.01 to 0.5; q has a value of 0 to 0.5; and m + n + o + p + q ≈ 1. |