Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_58ac4593a6956810f8cd442941e2fce4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2317a4d7266cdec065a103cc3072f4f0 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00252 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-129 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J8-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J8-1827 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J8-1818 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F23C10-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-03 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J8-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F23C10-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-029 |
filingDate |
2009-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cbc3dcc5cd95cca82ba9d615b5c27d3 |
publicationDate |
2010-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2010053659-A1 |
titleOfInvention |
Silicon production with a fluidized bed reactor utilizing tetrachlorosilane to reduce wall deposition |
abstract |
Silicon deposits are suppressed at the wall of a fluidized bed reactor by a process in which an etching gas is fed near the wall of the reactor. The etching gas includes tetrachlorosilane. A Siemens reactor may be integrated into the process such that the vent gas from the Siemens reactor is used to form a feed gas and/or etching gas fed to the fluidized bed reactor. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10105669-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10265671-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014035878-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014523842-A |
priorityDate |
2008-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |