| abstract |
Provided are a composition with which a metal film can be produced directly from a high-atomic-valence metal compound, a method for producing a metal film, and a method for producing a metal powder. The composition for producing a metal film of copper, silver, or indium comprises a high-atomic-valence compound of copper, silver or indium; a linear, branched or cyclic C1-18 alcohol; and a group VIII metal catalyst. The copper, silver, or indium metal film is produced by subjecting a film formed from the same composition to heating and reduction. The copper, silver, or indium metal film can also similarly be produced by substituting the high-atomic-valence compound of copper, silver, or indium with copper, silver, or indium metal particles wherein the surface layer is formed from the high-atomic-valence compound of copper, silver, or indium. |