| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f12e01d26210512883d6d83a08b2ffa2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eec514a68446bef421a314b406dbbfbb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730b0d630e6dc2bddede5015d204e462
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4deb115d349f04064d5d8d32d5959c1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bfdf49224a405be1f7b653c56ebad94 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3407
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3423
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3435 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B31B50-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2009-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c40a865b199f5b1e2ff7433bfd032fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7403e547a23b4d3ed965d3806bdcf47f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_371d5a6ff8f1d47df81224254684f2ea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b69c83c057bf986acf2bf74db6dd878 |
| publicationDate |
2010-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2010035718-A1 |
| titleOfInvention |
Cylindrical sputtering target, and method for manufacturing same |
| abstract |
Provided is a cylindrical sputtering target, which has a high production yield of a filming step even when sputtering film formation is performed by using a long cylindrical sputtering target composed of multiple cylindrical target materials. nA multi-divided cylindrical sputtering target is manufactured by joining a cylindrical base and multiple cylindrical target materials with a joining material. The cylindrical sputtering target is characterized by having divided portions in which the adjoining cylindrical target materials are arranged at a spacing, and in that the cylindrical target materials adjoining at the divided portions have a step of 0.5 mm or less at the outer circumferences thereof. The target is manufactured by fixing the cylindrical target materials on the basis of the outer circumferences of the cylindrical target materials, when the cylindrical target materials are arranged on the basis of the cylindrical base. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013136817-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013241646-A |
| priorityDate |
2008-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |