http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010027100-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13b1a9894dada502e7a49ce558db305e http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_22e62c15440507253f227089036b5e30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81ab4f439282bf4b11758b57cefe0357 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_02cfb0f1aa2718c61bdf184d53adfe79 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49826 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-709 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F16F15-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F16F15-00 |
| filingDate | 2009-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b078fd5de52dab91000bedc4129e02f6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6556576090a59482b4e40a24c9cf67ad http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b46903625ecc4515722b481239fe7a6 |
| publicationDate | 2010-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2010027100-A1 |
| titleOfInvention | System for isolating an exposure apparatus |
| abstract | A precision assembly (10) for fabricating a substrate (42) includes a precision fabrication apparatus (12), a pedestal assembly (14) and a suspension system (16). The precision fabrication apparatus (12) fabricates the substrate (42). The pedestal assembly (14) supports at least a portion of the fabrication apparatus (12). The suspension system (16) inhibits the transfer of motion between the mounting base (20) and the pedestal assembly (14). The suspension system (16) can include (i) a first boom (380) that is coupled to the mounting base (20) and the pedestal assembly (14), the first boom (380) being pivotable coupled to at least one of the mounting base (20) and the pedestal assembly (14), and (ii) a first resilient assembly (382) that is coupled between the mounting base (20) and at least one of the first boom (380) and the pedestal assembly (14). The first resilient assembly (382) can function similar to a zero length spring over an operational range of the resilient assembly (382). With this design, the components of the precision fabrication apparatus (12) are better protected by the suspension system (16) during a seismic disturbance. This reduces the likelihood of damage and misalignment of the components of the precision fabrication apparatus (12) during the seismic disturbance. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108463928-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014532301-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107502727-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107502727-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9447839-B2 |
| priorityDate | 2008-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.