http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010009225-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-38
filingDate 2009-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a4bd53659d555f7a9218bdf7acedde3
publicationDate 2010-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2010009225-A1
titleOfInvention Cyanide free electrolyte composition for the galvanic deposition of a copper layer
abstract A cyanide-free electrolyte composition for the galvanic deposition of a copper layer on substrate surfaces and a method for the deposition of such layers. The electrolyte composition comprises at least copper(II) ions, a hydantoin and/or hydantoin derivative, a di- and/or tricarboxylic acid or salts thereof, and a metalate of an element of the group consisting of molybdenum, tungsten and vanadium and/or a cerium compound.
priorityDate 2008-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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