| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9aed6706c640f8f7f6cae0cf8dffa0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_34866a6c36239eeae01349c58e35ddd0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f7f120efe096284c7389702c969cf3d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_177ac4c062bb6dc2e2839075591cb60b |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08C19-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F236-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08C19-02 |
| filingDate |
2009-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e50da513f26a5855361b70805593163
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8929a0aa119e9fc7dd24db9f03cddded
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed73bbe9e8883ce91eccc3ebcb7a8824 |
| publicationDate |
2009-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2009157533-A1 |
| titleOfInvention |
Nitrile group-containing highly saturated copolymer rubber |
| abstract |
A nitrile group-containing highly saturated copolymer rubber having an a,ß-ethylenically unsaturated nitrile monomer unit (a) and a conjugated diene monomer unit (b), wherein at least a part of the conjugated diene monomer unit (b) is hydrogenated. The nitrile group-containing highly saturated copolymer rubber is characterized in that the a,ß-ethylenically unsaturated nitrile monomer unit (a) is contained at a ratio of 37-45% by weight; the total of the a,ß-ethylenically unsaturated nitrile monomer unit (a) and the conjugated diene monomer unit (b) is not less than 93% by weight; the iodine number thereof is not more than 9; and a crosslinked product thereof has a half width of the loss tangent tand peak for viscoelasticity characteristics within the range of 5-20°C. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018158972-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016224011-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10308793-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170089874-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10752717-B2 |
| priorityDate |
2008-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |