| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9fee8cb0cb8d997a1795f6777352372b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e4d40e7329cb4d9fd4abbf78811c373d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6a162b65402a9a79580e3ae31dcbf3fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5216e8dac0e68d3d0e60dd610af34afd |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-201 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-50 |
| filingDate |
2009-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8066d2b1d7a8270d0d3a94ee50026c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b214842010a01a64dccf743a1ffd2f88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90e53547fbb45343ed666fed5d02956a |
| publicationDate |
2009-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2009145032-A1 |
| titleOfInvention |
Method for producing color filter, method for producing substrate with pattern, and small photomask |
| abstract |
Disclosed is a method for producing a color filter, wherein a filter segment and a black matrix are formed by repeating at least the following steps a plurality of times in the following order: an application step of applying a photosensitive resin composition onto a substrate; an exposure step of pattern-exposing and curing the photosensitive resin layer; a development step of developing the photosensitive resin layer; and a firing step of thermally curing the photosensitive resin layer after development. In the exposure step, a proximity exposure is performed through a photomask for pixel formation using a laser as a light source in such a manner that the integrated light exposure is 1-150 mJ/cm 2 . |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102687045-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019159949-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I487955-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014052470-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102687045-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013094555-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017173828-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017187765-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013094555-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011128286-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010272606-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8767324-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011074216-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019159949-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012255889-A |
| priorityDate |
2008-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |