| abstract |
Process for preparing a glass etching solution that is free from ammonium ions and from difluoride ions, that uses a composition that is free from ammonium ions and from difluoride ions comprising from 30% to 100%, preferably from 40% to 70%, by weight per 100% of the total weight of at least one soluble potassium salt and from 0% to 70%, preferably from 30% to 60%, by weight per 100% of the total weight of at least one inert filler. |