http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009119623-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5326e8f91671f0c429f7fb590b7221ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8412303829f82505584efd929e126dd0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-916 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F283-065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-676 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-91 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2009-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad1a6848cb80fe3f3f2d7d9a5977503e |
| publicationDate | 2009-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2009119623-A1 |
| titleOfInvention | Photosensitive resin and photosensitive resin composition comprising the same |
| abstract | Disclosed is a photosensitive resin which can be produced readily at a low cost, is easy to adjust its cross-linking density and acid value and therefore has a wide variety of use applications, has a high sensitivity, and has excellent patterning properties. The photosensitive resin is produced by adding a compound having reactivity to a carboxylic acid and also having an ethylenically unsaturated group to a polymeric compound, wherein the polymeric compound is produced by reacting a compound represented by general formula (1) with a compound represented by general formula (2). [In general formula (1), Y represents -CO-, -SO 2 -, -C(CF 3 ) 2 -, -Si(CH 3 ) 2 -, -CH 2 -, -C(CH 3 ) 2 -, -O-, a cyclohexyl group, a 9,9-fluorenyl group or a direct bond; R 1 and R 2 independently represent a hydrogen atom or a methyl group; and n and m independently represent a number of 0 to 4.] [In general formula (2), X represents a tetravalent carboxylic acid residue.] |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013103984-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011219661-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017219838-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013073157-A1 |
| priorityDate | 2008-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 273.