http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009113913-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7154c9da2ce89e8c30172c25f7e251aa |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P10-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B9-003 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B34-1295 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B9-226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B9-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27B14-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J17-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B9-21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F27B14-06 |
| filingDate | 2009-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acab70d1244353f332250148f7bcd05f |
| publicationDate | 2009-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2009113913-A1 |
| titleOfInvention | Method for producing chemically active metals and the structural design of a vertical stationary plasmotron |
| abstract | The invention relates to producing metals and can be used removing nonmetallic impurities from chemically active and refractory metals. The inventive method involves generating an arc on an electrode and forming a plasma jet for heating a formed metal by virtue of a gas and the arc concentration achieved in a nozzle by means of electromagnetic field. The nozzle is protected by a molten reduced or incompletely reduced metal that flows thereon from a consumable electrode or separately poured on the nozzle. The thickness of said metal is adjusted according to melting modes by reversing the polarity on the electrode, the nozzle and on the formed metal, wherein a gas for plasma is formed in the arcing area above the nozzle by pumping to a vacuum through a metal ingot formation area situated under the nozzle. The stationary vertical plasmotron comprises a discharge chamber with a consumable anode electrode placed therein, a gas feeding unit, an inductor and a crystalliser. The lower part of the top section of the chamber is in the form of a funnel-shaped tray with an orifice which is made in the central part thereof and is used as a nozzle. A solenoid is disposed on the outer side of the chamber and an indicator and a crystalliser with the metal ingot inside are arranged in the bottom part of the chamber along the arc perimeter, the ingot being used as a cathode. The technical result consists in increasing the productivity. |
| priorityDate | 2008-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.