| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c4ebf3c2b56d342c36d7dc1d9de8002a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9bc71950c0928cb40c376eee97abe76e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_18d92c46f60af8af24e262b67381d7eb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T436-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2201-031 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C99-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B3-0024
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B3-0032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B25J7-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C3-00 |
| filingDate |
2009-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bae43d8981192c29bfb3f0ae6863d324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa12f61db527ce5e844b961d2639c275 |
| publicationDate |
2009-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2009111737-A1 |
| titleOfInvention |
Reconfigurable lithographic structures |
| abstract |
A lithographically structured device has an actuation layer and a control layer operatively connected to the actuation layer. The actuation layer includes a stress layer and a neutral layer that is constructed of materials and with a structure such that it stores torsional energy upon being constructed. The control layer is constructed to maintain the actuation layer substantially in a first configuration in a local environmental condition and is responsive to a change in the local environmental condition such that it permits a release of stored torsional energy to cause a change in a structural configuration of the lithographically structured device to a second configuration, the control layer thereby providing a trigger mechanism. The lithographically structured device has a maximum dimension that is less than about 10 mm when it is in the second configuration. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012154511-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2963615-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108858136-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108858136-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10441760-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9717484-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10722221-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11331085-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9308641-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011052752-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014249499-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012017024-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012154511-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014207019-A1 |
| priorityDate |
2008-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |