| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e18ed31cb76e83205618c3c24bbad408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2c8ebdab93008a60e857e92843da83b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fc6220b93fae4be14ada49e4ecc1860b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2009-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_daad59fab4d9039804c5e3f1b9239bac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65818c2c804abe344eb4fc4ea97e4d12 |
| publicationDate |
2009-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2009110582-A1 |
| titleOfInvention |
Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent composition |
| abstract |
Disclosed are a semiconductor surface treating agent composition, which can realize easy separation of an antireflection film layer in a production process of a semiconductor element or the like at a low temperature in a short time, and a method for treating a semiconductor surface using the semiconductor surface treating agent composition. The semiconductor surface treating agent composition can realize the separation of both an antireflection film layer and a resist layer and, at the same time, can realize the separation of a resist cured layer produced in an etching process. The semiconductor surface treating agent composition is characterized by comprising a compound, which generates fluorine ions in water, a carbon radical generating agent, and water and optionally an organic solvent. The method for treating a semiconductor surface is characterized by using the composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011027773-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015111640-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9006164-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2011027772-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5652399-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016095388-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103076725-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018180256-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9034810-B2 |
| priorityDate |
2008-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |