http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009088177-A3

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publicationDate 2009-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2009088177-A3
titleOfInvention Silicon-based hardmask composition (si-soh; si-based spin-on hardmask) and process of producing semiconductor integrated circuit device using the same
abstract A silicon-based hardmask composition is provided. The hardmask composition comprises (a) an organosilane polymer and (b) a solvent. The organosilane polymer is represented by Formula 1: { (SiO 1.5 - Y-SiO 1.5 ) x (R 3 SiO 1.5 ) y (XSiO 1.5 ) z }(OH) e (OR 6 )f (1). In Formula 1, x, y and z represent the relative ratios of the repeating units (SiO 1.5 - Y-SiO 1.5 ), (R 3 SiO 1.5 ) and (XSiO 1.5 ) in the polymer and satisfy the relations 0.05 ≤ x ≤ 0.9, 0.05 ≤ y ≤ 0.9, 0 ≤ z ≤ 0.9 and x + y + z = l; e and f represent the ratios of the numbers of the terminal -OH groups and -OR groups bonded to the silicon (Si) atoms to the number of the 2x+y+z silicon (Si) atoms in the polymer, respectively, and satisfy the relations 0.03 ≤ e ≤ 0.2 and 0.03 ≤ f ≤ 0.25; X is a C 6 -C 30 functional group containing at least one substituted or unsubstituted aromatic ring; R 3 is a C 1 -C 6 alkyl group; Y is a linking group selected from the group consisting of an aromatic ring, a substituted or unsubstituted linear or branched C 1 -C 20 alkylene group, a C 1 -C 20 alkylene group containing at least one aromatic or heterocyclic ring or having at least one urea or isocyanurate group in the backbone, and a C 2 -C 20 hydrocarbon group containing at least one multiple bond; and R 6 is a C 1 -C 6 alkyl group.
priorityDate 2008-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 44.