Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c094b8bb0b3b2b91855f27ca8bab4d8f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_84682298a707b526081564c6bb3fb63a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2a819eda0adf22936a52362eeebb9fb4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9800169da41f7beea332d87c7b79460f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_610f962dcdbb355dd0f05aa13cc0cafb |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03G13-286 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G15-16 |
filingDate |
2008-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e0f15d074e48d79102bd7877bd49e33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_015b2f2de477502d24761696964f449c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48b733eb750d512c829498cdc4adf9cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f0f6d649a0371f7800a98751573d2fc |
publicationDate |
2009-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2009086184-A1 |
titleOfInvention |
Organo-metallic hybrid materials for micro- and nanofabrication |
abstract |
One embodiment of the present invention provides a photosensitive organo-metallic hybrid material which functions as both a structural material and a photoresist material. More specifically, this photosensitive organo-metallic hybrid material includes an organo-metallic compound comprised of at least one unsaturated double bond. The photosensitive organo-metallic hybrid material also includes a cross-linking agent comprised of at least two unsaturated double bonds capable of cross-linking the organo-metallic compound to form an organo-metallic hybrid material. Additionally, the photosensitive organo-metallic hybrid material includes a photoactive compound capable of absorbing exposure light during a photolithography process to form the photosensitive organo-metallic hybrid material. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102478765-A |
priorityDate |
2007-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |