| abstract |
It relates to an etchant composition for glass substrates and more particularly, to an etchant composition including 10-45wt% of an inorganic salt including fluorine to the total weight of the composition; 1-10wt% of NH4HF2; 1-10wt% of an acid having a lower acid dissociation constant (pKa) than the inorganic salt including fluorine; and water to make the total weight of the composition be 100wt%, in which the etchant composition for glass substrates allows reduced complexity and manufacturing cost by using simple elements, provides high etch rate, etches the surface of a glass substrate smoothly, exhibits excellent etchability, and improves image quality. |