| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_04656722af4b42bcb037f82fd5eb28fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0afae2e1868ed1efe351fe3ee3149b37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8a16e2fa556744225f7c2bba36087e7f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e5ab4c4ad3a4f6f14241b56386311fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cb3d23d1796e46b75065fa1f443561af |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2008-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74633963e43f3fbb80dddcfbd3769d1f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da334a460454ddf8e76f6187648ad205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dac69a65386a8584674a7e03659cdff7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5a96e400980a352f014ac6ad941f11c |
| publicationDate |
2009-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2009057638-A1 |
| titleOfInvention |
Positive photosensitive resin composition, method for forming pattern, electronic component |
| abstract |
Disclosed is a positive photosensitive resin composition which can be developed with an aqueous alkali solution and enables to obtain a pattern which is excellent in heat resistance and mechanical characteristics, while having a good shape. Also disclosed are a method for forming a pattern and an electronic device. Specifically disclosed is a positive photosensitive resin composition containing (a) a polybenzoxazole having a structural unit represented by the general formula (1) or (2) and satisfying the conditions (i) and/or (ii) or a polymer serving as a precursor thereof, (b) a compound generating an acid when irradiated with an active ray, and (c) a compound having a structure represented by the general formula (3) which is crosslinkable or polymerizable with the component (a) by heat. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101333690-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108388082-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108388082-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017134701-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011180473-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11592744-B2 |
| priorityDate |
2007-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |