| abstract |
This invention provides a method for forming a microstructure, which can prepare a microstructure without positioning a plurality of components in a simple and highly accurate manner. The method comprises (1) a first step of, while rotating a mask pattern and a photocurable resin around one rotating shaft extended through the mask pattern and the photocurable resin, exposing the photocurable resin to light through the mask pattern in an oblique direction to the rotating shaft to form, in the exposed part of the photocurable resin, a light absorption distribution including a higher exposure part, in which the light absorption is a curing reference value, which is a threshold of the light absorption for curing the photocurable resin, or a higer value and a lower exposure part, in which the light absorption is below the curing reference value, and (2) a second step of forming at least a part of a microstructure by at least a part of the high exposure part of the photocurable resin. |