Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_85b8e73d5fc3e0a1bed991feebaf49d5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_66a9031c41fa72baa4e6f9e93a25cc5a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_becb4c7abd0e7fd9b87f121a7da85f52 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-42 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-42 |
filingDate |
2008-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_adb88b8be3d9b7689ec01f7f59fd7a2c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f06883af2005ae975ed94eed197f6053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8148f264637220f9fd7c919c2170f12b |
publicationDate |
2009-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2009032238-A1 |
titleOfInvention |
Chloride analysis in acid copper plating baths |
abstract |
The chloride concentration in an acid copper plating bath is determined from the chloride oxidation current measured under controlled hydrodynamic conditions at a noble metal electrode using specific voltammetric parameters. The measurement is made directly on the undiluted plating bath so that the chloride measurement is fast and no waste stream is generated. |
priorityDate |
2007-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |