Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e0979d948cb03f51afe8f9254785ca71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_664f5b543543aac4cf0153a4ef4e0f85 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6ce93999627c95f3a4bab3bb6c47aa58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_769c19088c0ab2c47d899c580b5d9c75 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2110-0066 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2375-08 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D18-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-6685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J9-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4829 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4854 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D13-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 |
filingDate |
2008-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b390a5b843be55d40b254f5c5fcff4f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c609c8e564f217a8456dabe8bebeeadd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2a303c84f437ee9c6483d1b5e4d41c4 |
publicationDate |
2009-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2009029322-A1 |
titleOfInvention |
System and method for producing damping polyurethane cmp pads |
abstract |
A solid product formed by polymerizing a urethane prepolymer in the presence of a curative has a Bashore rebound that is less than about 38%. Preferably, the urethane prepolymer is an aliphatic isocyanate polyether prepolymer and the curative includes an aromatic diamine and a triol. To form a microcellular polyurethane material, the urethane prepolymer is frothed with inert gas, in the presence of a surfactant, then cured. The polyurethane can by employed to form highly damping CMP pads that have low rebound and can dissipate irregular energy and stabilize polishing to yield improved uniformity and less dishing. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8052507-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009067393-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013516768-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2578359-A1 |
priorityDate |
2007-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |