abstract |
A polymer comprising (i) two or more recurring units selected from : (1) to (7) where each of R61, R62, R63. and Res are individually selected from hydrogen or C1-4 alkyl; and R64 is C1-4 alkyl; and (ii) at least one additional recurring unit selected from (8) to (19), where each R61, R62, R63, R64, and R65 are individually selected from hydrogen or C1-4 alkyl and n is a number 0 to 3, is useful a component of photoresist compositions. |