| abstract |
A base material with junction film comprising a base sheet (base material) and, superimposed on the base sheet, a junction film so as to be joinable with an opposite base sheet (another adherend). This junction film contains an Si skeleton of random atomic arrangement having a siloxane (Si-O) bond and an eliminable group bonded to the Si skeleton, wherein the Si skeleton has a crystallization degree of 45% or below. This junction film when exposed to ultraviolet radiation has its eliminable group eliminated from the Si skeleton, so that adherence to the opposite base sheet is developed on the surface of the junction film. |