| abstract |
A plastic molding which comprises a plastic base and a vapor-deposited film formed on the base surface by plasma-assisted CVD. The vapor-deposited film comprises: an organometallic vapor-deposited layer having a C/Si element ratio of 2.5-13 and an O/M element ratio of 0.5 or lower; and a hydrocarbon-based vapor-deposited layer which has a thickness of 40-180 nm and which, in an FT-IR examination, has peaks attributable to CH, CH2, and CH3 in the wavenumber range of 3,200-2,600 cm-1, the proportion of CH2 and that of CH3 being 35% or less and 40% or more, respectively. The base of the plastic molding is prevented from suffering oxidative deterioration, thermal deterioration, etc. during the film deposition. Thus, a plastic molding is provided which is improved in oxygen/water barrier properties, adhesion, and unsusceptibility to the film peeling caused by water. |