| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb2648e65ad8850515bd727a122f1186
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4a14ef511c024661e8ef1d0a54f36377
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c40f99bb8025226a5ef6992bb92240f0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4966
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823842
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28088 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-32 |
| filingDate |
2008-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b5d7fe4d9910bc40e4bfba33243d8fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_459740a71680b1a549c77feb19366f48 |
| publicationDate |
2008-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2008129508-A2 |
| titleOfInvention |
Deposition of transition metal carbide containing films |
| abstract |
Methods and compositions for the deposition of a transition metal containing film in a semiconductor manufacturing process. A first vaporized metal precursor is introduced into a reaction chamber along with a second precursor mixture which comprises at least one carbon source. The reaction chamber contains at least one substrate, and a metal containing film is formed on the substrate through a deposition process. |
| priorityDate |
2007-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |