Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_add76ac5264c1e29252bebbc3d3bde42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_62d0a34e7476d1f41fc7a7bf85d2c440 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_68645db5ce31eddffdc0363329710c8c http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ed3ed2547bd2245b517b85783370fd6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd221d21998567268ab28734915df324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_841a461bc0954d57eda5b64a4007a489 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2469c2f7ed4279b90d522c93970b21b4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0b14e55f8d0449ca751b88c7de9422d2 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B23-066 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-076 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-086 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B23-08 |
filingDate |
2007-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5bb08d8c352c1776849e95dffa73534 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e16abf5f62c3af38c64cc622240028d6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6d55d6b53ed9c94cc369857ad5fd1cd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b4e6a8097f649b1fd6c190eb8d95e7c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08de71ece1e2316e0ecffc1c516ac1ef http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_644b5cc7a8e143a108e95a9cd9ef0212 |
publicationDate |
2008-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2008069028-A1 |
titleOfInvention |
Thin film manufacturing method and hexagonal piezoelectric thin film manufactured by the method |
abstract |
A rectangular magnetron circuit (23) is arranged on the lower surface of a rectangular target (22). A half of the target (22) is covered by a shielding plate (51) so that sputter particles flying out of the erosion region (39) (region where the magnetic flux density is largest) will not reach a substrate (28). The substrate (28) is arranged at the height of a position inside the plasma region (38) in a vacuum chamber (21) so that sputter particles (ZnO) flying out of the region exposed from the shielding plate (51) of the erosion region (39) come to the surface of the substrate (28). This reduces the gas pressure and prolongs the average free process of the sputter particles, which enables a large amount of sputter particles having a high energy to come to the surface. As a result, hexagonal crystal particles having a (11-20) face as a crystal face which is not easily damaged by the incident sputter particles of a high energy grow with a higher priority and an in-c-axis plane orientation film is formed. |
priorityDate |
2006-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |