Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bd805929a60e205a4d01829ec0ef2373 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_985bce4fef3813790ba285fc5e71d578 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d74758ba3d4cc5848ad20cfc2b10ecca |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F17-235 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F17-206 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B13-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B13-145 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01F17-235 |
filingDate |
2007-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fb19c2c846b532c9f7e8e63e03adf14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_118c477d1d7b1f24f000301d9dca1b73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b49f3c748a2aeb1bca135f7572511f20 |
publicationDate |
2007-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2007123203-A1 |
titleOfInvention |
Method for producing oxide particle, slurry, polishing agent and method for polishing substrate |
abstract |
Disclosed is a method for producing oxide particles which comprises a step for obtaining a mixture by mixing a metal carbonate and an acid, a step for obtaining a metal oxide by heating the mixture, and a step for pulverizing the metal oxide. Also disclosed are a slurry obtained by dispersing the metal oxide particles produced by such a method in an aqueous medium, a polishing agent and a method for polishing a substrate. Further specifically disclosed is a polishing agent containing cerium oxide particles which are obtained by using cerium carbonate as the raw material metal carbonate and oxalic acid as the raw material acid. The method for producing oxide particles enables to quickly obtain fine particles not containing coarse particles or worn powder. A polishing agent using the thus-produced oxide particles enables to precisely polish a semiconductor surface, while maintaining an appropriate polishing rate and reducing generation of scratches. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009280480-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015004119-A |
priorityDate |
2006-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |