| abstract |
Disclosed is a transparent conductive film having excellent electrical conductivity and etching properties. Also disclosed is a method for producing the transparent conductive film. The transparent conductive film contains Zn, Sn and O, wherein the molar ratio of Zn to the sum total of Zn and Sn (Zn/(Zn+Sn)) is 0.41 to 0.55. The transparent conductive film is amorphous. The method comprises the step of spattering a sintered body (a target) in an inert gas atmosphere, wherein the sintered body contains Zn, Sn and O and the molar ratio of Zn to the sum total of Zn and Sn (Zn/(Zn+Sn)) in the sintered body is 0.53 to 0.65. |