| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-11 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-20 |
| filingDate |
2007-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efc773bd787d3c50f8c33548dc7a2419
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db451909e4faf6efb2973a544621d4ee |
| publicationDate |
2007-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2007105082-A1 |
| titleOfInvention |
Base soluble polymers for photoresist compositions |
| abstract |
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or Ϝ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described. |
| priorityDate |
2006-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |