| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_224c28f176217bd07d975a4237260dd1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7efb70292e596bfcb452ef1f71ad904a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a087c36ccc055225bf451a92e1f58a79 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2006-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c49637c734ffe91ad9b85db63a3fedf6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce379197770c17e55e686599360e9b76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_363e287247b73cc7db02bb210c8fa504 |
| publicationDate |
2007-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2007058345-A1 |
| titleOfInvention |
Radiation-sensitive resin composition |
| abstract |
This invention provides a radiation-sensitive resin composition that is good in the shape of a pattern provided by a liquid immersion exposure method, is excellent in resolution and focal depth latitude, and is small in amount of eluate into a refractive liquid (immersion liquid) with which the composition has come into contact during liquid immersion exposure. The radiation-sensitive resin composition is used in the formation of a photoresist film by liquid immersion exposure lithography in which a radiation is applied in such a state that a liquid for liquid immersion exposure having a refractive index of more than 1.44 and less than 1.85 at a wavelength of 193 nm is interposed between a lens and a photoresist film. The radiation-sensitive resin composition comprises a resin and a radiation-sensitive acid generator. The resin comprises a repeating unit having a lactone structure, is insoluble or sparingly soluble in an alkali, and is rendered easily soluble in an alkali through the action of an acid. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009292983-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007191566-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007272194-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8080361-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010183979-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8450041-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9052594-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8617785-B2 |
| priorityDate |
2005-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |