http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007051632-A3
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ff6b446e30fec9d2424ecaff37c1d806 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8d89df16da4af87bff5d922ea97e2540 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6feb7560d7f4407999e0e2eebbce3139 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D305-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2096 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C59-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D305-12 |
| filingDate | 2006-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44691432c1177446df6dc196d07ffbc3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0846daa6815d81d6bbc8c9d5d66de29b |
| publicationDate | 2007-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2007051632-A3 |
| titleOfInvention | Surfactant precursor |
| abstract | Use, as a surfactant precursor, of a compound having the general Formula (I) wherein at least one of R1 and R2 is a hydrophobic moiety. A dispersion comprising a surfactant obtained by activation of said surfactant precursor. A method for breaking a dispersion comprising a surfactant obtained by activation of said surfactant precursor. A microemulsion comprising, as a surfactant, a compound obtained by activation of said surfactant precursor. A method for reducing the surface tension between a liquid and another phase, using said surfactant precursor. Various applications making use of the surfactant properties of the surfactant obtained by activation of said surfactant precursor. |
| priorityDate | 2005-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.