| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_175351044f02b424b05da196df66f32d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_963db27a741784c105a496744575ccb8 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24479
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-424
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-034
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3842 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C99-009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1847
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L11-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-18 |
| filingDate |
2006-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df71528b5abed723d19a832fd4634105 |
| publicationDate |
2007-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2007029810-A1 |
| titleOfInvention |
Process for producing 3-dimensional mold, process for producing microfabrication product, process for producing micropattern molding, 3-dimensional mold, microfabrication product, micropattern molding and optical device |
| abstract |
A process for producing a 3-dimensional mold, comprising the irradiation step of irradiating a processing object having a resist layer from an organopolysiloxane on a base material on the resist layer with electron beams and the development step of subjecting the resist layer after the electron beam irradiation to development by thermal desorption treatment to thereby form protrusions and depressions on the resist layer. Further, there are provided a process for producing a microfabrication product with the use of the 3-dimensional mold; and a process for producing a micropattern molding with the use of the 3-dimensional mold or microfabrication product. Still further, there are provided, produced with high precision by these processes, a 3-dimensional mold, microfabrication product and micropattern molding, and provided an optical device. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013149989-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009143089-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017170853-A |
| priorityDate |
2005-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |