| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_68095c7c31b8267754a368d8ff73c802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3ca66d1d564932beb972e4feef611f34 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2006-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27a131379c0860ea0fcec3ecadb89fa8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c1eb35b62641ff06833a6d93f942cf3 |
| publicationDate |
2007-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2007013311-A1 |
| titleOfInvention |
Cleaning liquid for lithography |
| abstract |
Disclosed is a cleaning liquid for lithography which is used for cleaning and removing unnecessary portions of a resist film formed on a substrate or a photoresist remaining in a photoresist supply system when a resist pattern is formed by lithography. As such a cleaning liquid, there is used a solvent which is capable of completely dissolving and removing an unnecessary resist while being able to be dried quickly after use. Since such a solvent is required not to adversely affect the resist film after processing, components of the solvent depend on the kinds of resists it is used for. A cleaning liquid which is effective for a photoresist for ArF excimer laser that is composed of an acrylic polymer has not been known until now. The present invention provides a cleaning liquid for lithography which is effective for removing a photoresist for ArF excimer laser, and this cleaning liquid contains an alkoxycarboxylic acid alkyl ester alone or together with an alkoxybenzene as a solvent mixture. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012037657-A |
| priorityDate |
2005-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |