| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9c4d7a0361061d9fc84070917b3b609e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_695a3c7355394ae7a957e673925b46c9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fa7f735d136cf9ea7742bcbc368cc105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3860caa003ee436680367ce01138bfaf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd1c923ea46d110f6bec3c393b55cb11 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2005-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5171ec930806ffec27e53e3c2b9fb05d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8613a7e8e7daae3565a8de976ac828b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fda0e13fb1c59bf774d2439d76d6ed5a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb2411c226b40dbe3fd91b450a359df8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0df78a12c024adffd6cfa15ad332248f |
| publicationDate |
2006-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2006135136-A1 |
| titleOfInvention |
Antireflective hardmask composition and methods for using same |
| abstract |
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include: (a) a polymer mixture including a first polymer that includes one or more of the following monomeric units described in this specification and a second polymer including an aryl group; (b) a crosslinking component; and (c) an acid catalyst. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104335079-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010122297-A |
| priorityDate |
2005-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |