| abstract |
Disclosed is a radioactive ray-curable liquid resin composition for use in optical stereolithography which has a good storage stability. The composition preferably comprises a compound represented by the general formula (1), a compound having a phenolic hydroxyl group, a cationically polymerizable compound, a radical polymerization initiator, a radically polymerizable compound, at least one sulfur-containing compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithio)benzothiazole, diisopropyl xanthogen disulfide and diphenyl disulfide, and a polyether polyol compound. [Chemical formula] (1) |