| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_459e9a59c51dc3ddfeffc73cb9b99e32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4de3ffdab332f480c966283c96016f7f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 |
| filingDate |
2006-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2d979fff220ce2e10170f7ad343b252
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05db2ff8d893b0d4d6570fd852f59161 |
| publicationDate |
2006-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2006134846-A1 |
| titleOfInvention |
Curing accelerator, thermosetting resin composition, photosensitive composition, photosensitive film, permanent pattern and method for forming same |
| abstract |
Disclosed is a curing accelerator composed of a compound which generates an amine upon external stimulation and has carboxyl groups and amide groups in a molecule at a ratio of 1:1. Also disclosed is a photosensitive composition characterized by containing such a curing accelerator, a polymer having one or more of carboxyl groups or one or more of ester groups in a molecule, a polymerizable compound, and a photopolymerization initiator. This photosensitive composition is excellent in storage stability and can be used as a photosensitive film. Further disclosed is a method for forming a permanent pattern wherein such a photosensitive film is arranged on the surface of a base, and then exposed, developed and heated thereon. |
| priorityDate |
2005-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |