| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5dda841bc20b6d678e9d1f24f5adbb60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9426baae866be9d43efa69306f68eeca |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24421
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-2991
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-2982 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-0081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-113
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-141
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11 |
| filingDate |
2006-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46e317fde8b952757ed43fa0c48086eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50243733221800a8efcae660f5eaaf47 |
| publicationDate |
2006-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2006129408-A1 |
| titleOfInvention |
PROCESS FOR PRODUCING DISPERSION OF HOLLOW FINE SiO2 PARTICLES, COATING COMPOSITION, AND SUBSTRATE WITH ANTIREFLECTION COATING FILM |
| abstract |
A process for producing a dispersion of hollow fine SiO2 particles which contains no residual fine core particles, does not generate uncontrollable aggregates, and is easy to filtrate. The process, which is for producing a dispersion comprising a dispersion medium and hollow fine SiO2 particles dispersed therein, is characterized by comprising the following steps (a), (b), and (c): (a) a step in which a precursor for SiO2 is reacted at a pH higher than 8 in the dispersion medium in the presence of fine ZnO particles constituting cores to yield SiO2 and thereby obtain a dispersion of fine particles comprising the fine ZnO particles coated with the SiO2 yielded; (b) a step in which the fine-particle dispersion obtained in the step (a) is mixed and contacted with an acid cation-exchange resin to dissolve the fine ZnO particles serving as the cores at a pH of 2-8; and (c) a step in which after the fine ZnO particles are completely dissolved, the acid cation-exchange resin is removed by a solid-liquid separation operation to obtain the dispersion of hollow fine SiO2 particles. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7280127-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012051770-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2010018852-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103013270-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010018852-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015093379-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019189020-A1 |
| priorityDate |
2005-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |