| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d0288ebc8caf153d78768aa4381b3111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9aed93678465d67abd8675e205ecd0ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f34119b232d292c72e632b62008eca90
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8008779f1d61cea6ac29eada6c32ad27 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-517
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-486
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-48 |
| filingDate |
2006-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fe067c6fbcb64909e7b4e91f4bfdb09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a3298b4b87e39c9e013d8e9cb36e749
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dd3f761ac9aa32aca45bee6de16ce96 |
| publicationDate |
2006-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2006116776-A2 |
| titleOfInvention |
Chemical vapor deposition system and method |
| abstract |
A method of forming a coating on the surface of a substrate comprising depositing on the substrate a first chemical moiety using a plasma-enhanced chemical vapor deposition, and approximately simultaneously depositing on the substrate a second chemical moiety using a low energy direct ion beam deposition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8426199-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108261597-A |
| priorityDate |
2005-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |