http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006107020-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_06888ac3ca1f81e83b3b23e4e62efc5b http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f26548eb066e07b87aaf08d6ec9dd97 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2006-80 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F7-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F7-62 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01F7-62 |
| filingDate | 2006-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e5eac09f4c9640591c6c5fe3da4d7b0 |
| publicationDate | 2006-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2006107020-A1 |
| titleOfInvention | High-purity anhydrous aluminum chloride and process for production thereof |
| abstract | High-purity anhydrous aluminum chloride which is freed as completely as possible from all the main (metal) impurities resulting from starting aluminum used in the industrial production of anhydrous aluminum chloride and which has contents of the main impurities except gallium (Ga) such as Na, K, Si and Fe of as low as 1ppm or below and a purity of 99.99wt% or above, preferably 99.999wt% or above as determined by subtracting the total content of impurities; and a process for the production of the aluminum chloride. |
| priorityDate | 2005-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.