http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006101850-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_da9bb9a4fe0b5f18879ad0d5e4bee5ea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eac19d25ea38c372dd93ebab5b312c1e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_670baead6375354144f37b8c545e75fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f5321063ed9404042ab4424540e5dff5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3dcb727aba47007cd0ade3cab7c66e76
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B34-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B34-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B34-00
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B34-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B34-24
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B34-00
filingDate 2006-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b86da16f9467bf48dd4d07c254235139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6056037cc700fb3b07362c49749ba7e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3e45c928dfd46d4466a863a2149be69
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9df209c0b995341dc9796ffa0742e763
publicationDate 2006-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2006101850-A1
titleOfInvention Method of preparing primary refractory metal
abstract A method of preparing primary refractory metais (e.g., primary tantalum metal) by contacting a particulate refractory metal oxide (e.g., tantalum pentoxide) with a heated gas (e.g., a plasma), is described. The heated gas comprises hydrogen gas. The temperature range of the heated gas and the mass ratio of hydrogen gas to refractory metal oxide are each selected such that: (i) the heated gas comprises atomic hydrogen; (ii) the refractory metal oxide feed material is substantially thermodynamically stabilized (i.e., the concurrent formation of suboxides that are not reduced by atomic hydrogen is minimized); and (iii) the refractory metal oxide is reduced by contact with the heated gas, thereby forming primary refractory metal (e.g., primary tantalum metal and/or primary niobium metal).
priorityDate 2005-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004042095-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/BE-1013557-A6
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448546538
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID139222
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23938
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419515157
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10198074
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559592
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID522689
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569951
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3033859
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419583170
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID160806
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24394
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID518712
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558793
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523855
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID28146
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577475
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449483415
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453171762
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451268575
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23936
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458431511
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23924
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577470
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123105
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593443
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450009737
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5416
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419531149
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419530175
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415841568
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82838
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23939
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82839
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23956
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558592
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23948
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID416641266
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23950

Total number of triples: 69.