| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_93eaf3421fc4f57e11d8b7529b29d23d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c72ad459cfacb1b12892184f81257195
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_068bd02968f0df46131a331ddcf56db3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-712
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-736
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-734
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2006-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c919713aec0be366fa25a49a831729e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f59f1432150f6d822819f6c866f49656
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81750fdea0c6b1b1260279002ad00441 |
| publicationDate |
2006-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2006090667-A1 |
| titleOfInvention |
Positive resist composition, method for forming resist pattern and compound |
| abstract |
Disclosed is a positive resist composition containing a base component (A) with an acid-cleavable dissolution inhibiting group whose alkali solubility is increased by the action of an acid, and an acid generator component (B) which generates an acid when exposed to light. The base component (A) contains a compound (A1) which is obtained by substituting a part or all of hydrogen atoms of a phenolic hydroxyl group of a polyvalent phenolic compound, which has a molecular weight of 300-2500 and is represented by the general formula (I) below, with at least one group selected from the group consisting of acid-cleavable dissolution inhibiting groups (II) represented by the general formula (II) below and acid-cleavable dissolution inhibiting groups (III) represented by the general formula (III) below. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5029598-B2 |
| priorityDate |
2005-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |