http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006081234-A3
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a6cdef9e250a477af38200550c3e1d80 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76846 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-5096 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4488 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 |
| filingDate | 2006-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e869fc408ba7451a5f39bb84cab58a3f |
| publicationDate | 2009-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2006081234-A3 |
| titleOfInvention | Ruthenium layer deposition apparatus and method |
| abstract | Embodiments of the invention provide apparatus and methods for forming a ruthenium-containing layer on a substrate (422) from a ruthenium tetroxide containing gas. Generally, the method includes exposing a substrate to a ruthenium tetroxide vapor to form a catalytic layer on the substrate and subsequently filling device structures on the substrate by at least one deposition process. In one embodiment, the ruthenium containing layer is formed on a substrate by creating ruthenium tetroxide in an external vessel (631) and then delivering the generated ruthenium tetroxide gas to a temperature controlled substrate positioned within a processing chamber (404). In another embodiment, a ruthenium containing layer is formed on a substrate, using the ruthenium tetroxide containing solvent. In another embodiment, the solvent is separated from a ruthenium tetroxide containing solvent mixture and the remaining ruthenium tetroxide is used to form a ruthenium containing layer on the substrate. |
| priorityDate | 2005-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.