Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_229b6343f2d2f826e71ef3c296542169 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_245a01bf72981e58d12e0027114e490d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cc74ddd8405290cbecc701e5c5e6b67 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C22-63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 |
filingDate |
2005-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c56df84ce1cbb0b6424d92a233f73e6d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5357c8aedea1992f3b4ac270390635b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c6c724e4bba8663c28b11e61333ecac |
publicationDate |
2006-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2006036368-A2 |
titleOfInvention |
Composition and process for ashless removal of post-etch photoresist and/or bottom anti-reflective material on a substrate |
abstract |
An aqueous-based composition and process for removing photoresist and/or bottom anti-reflective coating (BARC) material from a substrate having such material(s) thereon. The aqueous-based composition includes a quaternary ammonium base, at least one co-solvent, and optionally a chelator. The composition achieves highÂefficiency removal of photoresist and/or BARC material in the manufacture of integrated circuitry without adverse effect on metal species on the substrate, such as copper, and without damage to SiOC-based dielectric materials employed in the semiconductor architecture. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8062429-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7838483-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8802609-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009058278-A1 |
priorityDate |
2004-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |