abstract |
Precursor for ruthenium film deposition, comprising ruthenium tetroxide dissolved in at least one non-flammable solvent, preferably a fluorinated solvent having the general formula CxHyFzOtNu wherein: 2x+2<=y+z and 2<=x<=15 and z>y and t+u>=1 (t+u preferably equal to 1) x, y, z, t and u being positive integers. |