| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad0b6d5884e8c92112119b1bbdb8d7cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_29cdb9479522e79a5e750395d5a77432
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_764f68b6f912ab91c349fe8513df10e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c32e650a7f77d5402fc9430a46e06855 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67748
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2005-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7819acc90f884a90352de217c386730
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e850a7f2b36f0418dd3a7049aa79ef92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35b19f5fb75d92bd0db1191da4efdd44 |
| publicationDate |
2006-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2006009045-A1 |
| titleOfInvention |
Substrate heating equipment substrate heating method |
| abstract |
Substrate heating equipment performs heat treatment after exposure but prior to development to a substrate having a chemical-amplification resist film. The substrate heating equipment is provided with a placing table whereupon the substrate is placed substantially horizontal, with the resist film on top, a fluid supplying mechanism for supplying the substrate with glycerin, and a heating mechanism for heating the substrate on the placing table under the condition where the glycerin is brought into contact with the resist film. In the substrate heating equipment, the substrate on the placing table is heated under the condition where the glycerin is brought into contact with the resist film. |
| priorityDate |
2004-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |