http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005121396-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f710be056e11625371b3f3114d07977a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0227 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate | 2005-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e825435ee0ad382369136a70348bdd72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9862d973b4605f6c7443465356a26be3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3123bddae02f2a0b79d21870573e1e8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e9be6a4e68600a5c6081a237b9e0181 |
| publicationDate | 2005-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2005121396-A2 |
| titleOfInvention | Controlled deposition of silicon-containing coatings adhered by an oxide layer |
| abstract | We have developed an improved vapor-phase deposition method and apparatus for the application of films / coatings on substrates. The method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. In addition to the control over the amount of reactants added to the process chamber, the present invention requires precise control over the total pressure (which is less than atmospheric pressure) in the process chamber, the partial vapor pressure of each vaporous component present in the process chamber, the substrate temperature, and typically the temperature of a major processing surface within said process chamber. Control over this combination of variables determines a number of the characteristics of a film/coating or multi-layered film/coating formed using the method. By varying these process parameters, the roughness and the thickness of the films/coatings produced can be controlled. |
| priorityDate | 2004-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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