| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_59c6a921f33fe0adc58c2b6177184515
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_052dfe46cc2f93a561f56fd23d2cdbdd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2f33954c77b8e85845b7a976ba2059a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_058e951a1ed71ee5db8103fbe70af44f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0736cba6ea6f19b0ab4285fef035c9d5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-2697
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-2632
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0231 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-4427
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-4445
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-348
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-043 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B49-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-005 |
| filingDate |
2005-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2eb47e51dfeca7882af2bc08a3055527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_656fd55a412f587eb069da0d4ea69009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c0a862c17d5377c6b2b054daca8d66f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f7017f567d75c2490e852f23c53290a |
| publicationDate |
2005-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2005100976-A2 |
| titleOfInvention |
System and method for the identification of chemical mechanical planarization defects |
| abstract |
The present invention presents a novel application of a wavelet-based multiscale method in a nanomachining process chemical mechanical planarization (CMP) of wafer fabrication. The invention involves identification of delamination defects of low-k dielectric layers by analyzing the nonstationary acoustic emission (AE) signal collected during copper damascene (Cu-low k) CMP processes. An offline strategy and a moving window-based strategy for online implementation of the wavelet monitoring approach are developed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023283526-A1 |
| priorityDate |
2004-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |